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Wafer Cleaning and Etching
Wet Bench cleaning tools and etching tools has been popular in the front-end process of 6-8" wafer fabrication. However, as the technology moves on, the Single Wafer Handling cleaning and etching tools have become more important especially when the process requires for higher accuracy and better repeatability.
The tools for Chemical Cleaning and Etching are normally modularly configured and highly customized. It could have modules for coating, developing, cleaning, etching with different range of temperature control. The system configuration is important if Flux Cleaning process is needed. Chip-to-Wafer bonding (C2W) process has even made the cleaning process very critical.
The tools for Chemical Cleaning and Etching are normally modularly configured and highly customized. It could have modules for coating, developing, cleaning, etching with different range of temperature control. The system configuration is important if Flux Cleaning process is needed. Chip-to-Wafer bonding (C2W) process has even made the cleaning process very critical.